Suppose a n-type wafer is‘created by doping Si crystal having 5 x 1028atoms/m3 with 1 ppm concentration of As. On the surface 200 ppm boron is added to create ‘p’ region in this wafer. Considering ni = 1.5 x 1016 m-3,
(i) Calculate the densities of the charge carriers in the n and p regions,
(ii) Comment which charge carriers would contribute largely for the reverse saturation current when diode is reverse biased.
Suppose a n-type wafer is‘created by doping Si crystal having 5 x 1028atoms/m3 with 1 ppm concentration of As. On the surface 200 ppm boron is added to create ‘p’ region in this wafer. Considering ni = 1.5 x 1016 m-3,
(i) Calculate the densities of the charge carriers in the n and p regions,
(ii) Comment which charge carriers would contribute largely for the reverse saturation current when diode is reverse biased.
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1 Answer
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This is a Long Answer Type Questions as classified in NCERT Exemplar
whem As is used then it will create n type semiconductor
Ne=ND=
Number of minority carriers nh= = 0.45
But when B is implanted in Si crystal then p type semiconductor is formed
Nh=NA=
Minority carriers created in p type is
Ne=
Minority charge carriers holes in p type would contribute more in reverse saturatiom current.
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