Suppose a n-type wafer is'created by doping Si crystal having 5 x 1028atoms/m3 with 1 ppm concentration of As. On the surface 200 ppm boron is added to create 'p' region in this wafer. Considering  ni = 1.5 x 1016 m-3,
(i) Calculate the densities of the charge carriers in the n and p regions,
(ii) Comment which charge carriers would contribute largely for the reverse saturation current when diode is reverse biased.

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9 months ago

This is a Long Answer Type Questions as classified in NCERT Exemplar

whem As is used then it will create n type semiconductor

Ne=ND= 1 10 6 * 5 * 10 28 = 5 * 10 22 / m 3

Number of minority carriers nh= n i 2 n e = ( 1.5 * 10 16 ) 2 5 * 10 22 = 0.45 * 10 10 / m 3

But when B is implanted in Si crystal then p type semiconductor is formed

Nh=NA= 200 10 6 * 5 * 10 28 = 1 * 10 25 / m 3

Minority carriers created in p type is

Ne= n i 2 n e = ( 1.5 * 10 16 ) 2 1 * 10 25 = 2.25 * 10 27 / m 3

Mi

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Physics NCERT Exemplar Solutions Class 12th Chapter Fourteen 2025

Physics NCERT Exemplar Solutions Class 12th Chapter Fourteen 2025

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